| 发明名称 |
ETCHANT COMPOSITION |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a wet etchant used for etching in an aluminum-based metal wiring. SOLUTION: The wet etchant is an aqueous solution containing phosphoric acid, nitric acid, organic acid, and further cations.
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| 申请公布号 |
JP2003013261(A) |
申请公布日期 |
2003.01.15 |
| 申请号 |
JP20010192791 |
申请日期 |
2001.06.26 |
| 申请人 |
MITSUBISHI GAS CHEM CO INC |
发明人 |
ABE HISAOKI;MARUYAMA TAKEHITO;AOYAMA TETSUO |
| 分类号 |
G02F1/1343;C09K13/04;C09K13/06;C23F1/20;C23F1/26;H01L21/28;H01L21/306;H01L21/3213;H01L21/336;H01L29/786;(IPC1-7):C23F1/20;G02F1/134;H01L21/321 |
主分类号 |
G02F1/1343 |
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