| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and apparatus for the objective schlieren analysis/measurement, due to a shadow method fitted, not only to an optical glass material but also to a crystalline material. SOLUTION: The method for the schlieren objective analysis/measurement includes a step (a) for irradiating a test sample with a light from a light source, a step (b) for forming the shadow image of the test sample on a projection screen, a step (c) for receiving the shadow image of the test sample projected on the projection screen by an electronic picture-receiving device, a step (d) for processing the shadow image received by the electronic picture-receiving device to measure the schlieren image contrast and a step (e) for comparing the image contrast of the schlieren measured, on the basis of the shadow image of the test sample with the image contrast of the schlieren of the shadow image of the schlieren pattern of a comparison sample for measuring the schlieren of the test sample.
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