发明名称 GAS INJECTION PLATE OF ASHING APPARATUS
摘要 PURPOSE: A gas injection plate of an ashing apparatus is provided to prevent a depositing phenomenon of components of a photoresist layer by forming a gas injection plate with quartz. CONSTITUTION: A gas injection plate(30) has a circular shape on a plane. A plurality of screw holes(33) are formed on a peripheral portion(31) of the gas injection plate(30). The screw holes(33) are used for combining the gas injection plate(30) with an ashing apparatus. A plurality of injection holes(37) are formed on a center portion(35) of the gas injection plate(30). The peripheral portion(31) of the gas injection plate(30) is thicker than the center portion(35) of the gas injection plate(30) since the peripheral portion(31) of the gas injection plate(30) has mechanical intensity. The gas injection plate(30) can be formed with quartz. The peripheral portion(31) of the gas injection plate(30) can be formed with aluminium or stainless steel.
申请公布号 KR20030008295(A) 申请公布日期 2003.01.25
申请号 KR20010043345 申请日期 2001.07.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 MUN, JUN YEONG
分类号 H01L21/3065;(IPC1-7):H01L21/306 主分类号 H01L21/3065
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