| 摘要 |
A method for forming interconnect dual damascene structures comprising: first, performing a low-k dielectric spin-on; wherein the low-k dielectric is photosensitive and is copper; second, forming trench and vias in the low-k dielectric with a tri-tone mask; and third, applying a liner deposition in the trench and vias; wherein the tri-tone mask comprises a plurality of transmissions, wherein the transmissions of the tri-tone mask is in the range of 0% to 100%. The transmission of the tri-tone mask further comprises a transmission of 0% corresponding to non-erosion regions of the dielectric. Moreover, the transmission of the tri-tone mask further comprises a transmission of 100% corresponding to via regions of the dielectric. Furthermore, the range of 0% to 100% corresponds to trench regions of the dielectric.
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