发明名称 METHOD AND APPARATUS FOR ELECTRON BEAM LITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To increase an imaging speed by eliminating a dead time associated with computation for renewing, when suspending drawing and renewing the deflection region which can be followed. SOLUTION: Sample table coordinates, where the transfer of deflection amount which can be followed occurs, are predicted at all times during writing. Based on the estimated sample table coordinates, an amount of deflection of a main deflector at transfer is calculated in advance. Thereby, a downtime caused by the transfer of the amount of deflection which can be followed can be reduced, increasing the productivity of an electron beam lithographic apparatus.
申请公布号 JP2003037045(A) 申请公布日期 2003.02.07
申请号 JP20010223111 申请日期 2001.07.24
申请人 HITACHI LTD 发明人 TAKAHASHI HIROYUKI;MIYATA MASAYORI;KAWANO MASAMICHI
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
代理机构 代理人
主权项
地址