发明名称 Electrodeposition baths containing boron-containing compounds and methods related thereto
摘要 Disclosed is an improved electrodeposition bath having a reduced volatile organic content. The bath contains a resinous phase dispersed in an aqueous medium, the resinous phase including an active hydrogen-containing ionic electrodepositable resin and a curing agent therefor. The improved electrodeposition bath further includes a boron-containing compound in an amount sufficient to retard the growth of microorganisms in the bath. Also disclosed is a method of electrocoating a conductive substrate using the improved electrodeposition bath of the invention. Substrates which are coated using the method of the invention are also disclosed.
申请公布号 US2003034248(A1) 申请公布日期 2003.02.20
申请号 US20010919093 申请日期 2001.07.31
申请人 KAYLO ALAN J. 发明人 KAYLO ALAN J.
分类号 C09D5/02;C09D5/44;(IPC1-7):B32B9/04;C07K1/26;C25D1/12 主分类号 C09D5/02
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