发明名称 IMAGE SENSOR AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: An image sensor and a method for manufacturing the same are provided to be capable of restraining reset noise due to the potential variation of a sensing region when a reset transistor is off. CONSTITUTION: A field oxide layer(41) is formed on a substrate(40) to define an active region of a reset transistor. A gate insulating layer(43) is formed on the substrate of the active region. A gate(44) is formed on the gate insulating layer(43). A spacer(45) is formed at both sidewalls of the gate. A drain(46) as a sensing region(SR) and a source(47) as a power voltage(VDD) are formed in the substrate. A channel region(48) is formed at lower portion of the gate. An impurity region(42) is formed in the substrate to partially overlap the channel region(48) while surrounding the sensing region(SR).
申请公布号 KR20030039237(A) 申请公布日期 2003.05.17
申请号 KR20010070212 申请日期 2001.11.12
申请人 HYNIX SEMICONDUCTOR INC. 发明人 LEE, SANG JU
分类号 H01L27/146;(IPC1-7):H01L27/146 主分类号 H01L27/146
代理机构 代理人
主权项
地址