发明名称 EXPOSURE DEVICE AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To provide an exposure device constituted such that exposure can be varied in accordance with the sections of a substrate. SOLUTION: The exposure device is provided with 1st and 2nd light sources (U1 and U2) for emitting exposure light, a scanning part (112) for arranging light emitted from the 1st and 2nd light sources in the scanning direction and scanning the substrate with the light so as to expose a photoresist layer arranged on the surface of the substrate, and a lighting control part (126) for independently controlling the on/off of the 1st and 2nd light sources in accordance with the position of the light scanning direction so that the exposure can be varied in accordance with the sections of the substrate. The 1st and 2nd light sources are respectively provided with several light emitting parts which are two-dimensionally arranged. The numeric density of the light emitting part of the 1st light source is different from that of the 2nd light source.
申请公布号 JP2003156853(A) 申请公布日期 2003.05.30
申请号 JP20010354066 申请日期 2001.11.20
申请人 PENTAX CORP 发明人 HARA MASATO;KOBAYASHI YOSHINORI;ISHIBASHI SHIGETOMO
分类号 G03F7/20;H05K3/00;(IPC1-7):G03F7/20 主分类号 G03F7/20
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