发明名称 INSPECTION SYSTEM AND INSPECTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide an inspection system and an inspection method, where an inspection result and an inspection frequency are well balanced with each other by automatically changing the inspection frequency, corresponding to the state of the inspection result. SOLUTION: A decision unit 50 receives data RA to RC, which are outputted as inspection results from inspection devices 1A to 1C and has a function to determine the inspection rate of lots (inspection lot) to be inspected hereafter and the inspection rate of semiconductor wafers (inspection semiconductor wafer) contained in each lot and to be inspected hereafter by data processing carried out on the basis of the data RA to RC. That is, the decision unit 50 has a function to automatically change the inspection frequency of the lots and the wafers on the basis of the past inspection results. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003179107(A) 申请公布日期 2003.06.27
申请号 JP20010379843 申请日期 2001.12.13
申请人 MITSUBISHI ELECTRIC CORP 发明人 MUKOGAWA YASUKAZU;KUNIIE MICHIO
分类号 G01N21/956;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01N21/956
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