| 摘要 |
FIELD: medicine.SUBSTANCE: invention relates to medicine, namely to ophthalmology, and is intended for the treatment of resistant foci of retinoblastoma in children, located mainly in the central parts of the retina. Transpupillary impact on resistant foci using diode laser with wavelength of 810 nm. Exposure is produced on the perimeter of the foci of retinoblastoma in multiple sessions in an amount of not less than three, with an interval between sessions of 1-1.5 months in continuous scanning mode, at which zones of hyperpigmentation on the chorioretinal scar formed from the impact after a previous treatment session are absorbent to laser radiation at each subsequent session, wherein all subsequent sessions of exposure are produced on the perimeter of the residual focus of retinoblastoma till its full regression.EFFECT: method allows to preserve visual function in the long term by minimizing the traumatic impact of the local way of destroying tumor in functionally important structures of the eye, as well as reducing a risk of intraocular and systemic complications.1 cl, 2 ex |
