发明名称 CRYSTAL GROWTH METHOD OF COMPOUND SEMICONDUCTOR LAYER AND SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a crystal growth method of compound semiconductor layer which is suitable for forming a semiconductor light emitting element having an excellent crystal property by effectively controlling crystal defects. SOLUTION: A plane (111), a plane inclining to the plane (111) within±10°in angles, and a plane which is chemically equivalent to those planes, are formed as selective growth reference planes to a compound semiconductor substrate of a zincblende structure. Moreover, a compound semiconductor layer of a wurtzite structure is formed by the crystal growth method with the selective growth from the selective growth reference plane in order to form a plane (1-101), a plane with inclination to the plane (1-101) within±10°or the plane equivalent in the crystal property to those planes. Accordingly, the flat plane (1-101) having an excellent crystal property can be formed on the substrate. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003209062(A) 申请公布日期 2003.07.25
申请号 JP20020008825 申请日期 2002.01.17
申请人 SONY CORP 发明人 BIWA TSUYOSHI;OKUYAMA HIROYUKI
分类号 C30B29/38;H01L21/205;H01S5/323;H01S5/343;(IPC1-7):H01L21/205 主分类号 C30B29/38
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