发明名称 PATTERN FORMING METHOD AND SYSTEM THEREOF, DEVICE MANUFACTURING METHOD AND DEVICE
摘要 PROBLEM TO BE SOLVED: To save resources and energy. SOLUTION: A cleaning and liquid supplying head 22 is formed by integrating a cleaning head unit 60 and a liquid supplying head unit 70. The cleaning head unit 60 has an organic substance cleaning unit 62, an inorganic substance cleaning unit 64, a rinsing unit 66, and a drying unit 68. The organic substance cleaning unit 62, the inorganic substance cleaning unit 64, and the rinsing unit 66 selectively supply a first cleaning liquid 74, a second cleaning liquid 80, and purified water 88 respectively to pattern forming regions 108 of a substrate 10 for cleaning them. The drying unit 68 blows hot air 96 onto the rinsed pattern forming regions 108 for drying the pattern forming regions 108. The liquid supplying head unit 70 selectively supplies a liquid pattern material 102 onto the cleaned pattern forming regions 108. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003283103(A) 申请公布日期 2003.10.03
申请号 JP20020081214 申请日期 2002.03.22
申请人 SEIKO EPSON CORP 发明人 MORI YOSHIAKI
分类号 H05B33/10;B41J2/165;H01L21/288;H01L21/304;H01L21/306;H01L51/50;H05K3/10;H05K3/12;H05K3/26;H05K3/28;(IPC1-7):H05K3/10;H05B33/14 主分类号 H05B33/10
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