| 摘要 |
PROBLEM TO BE SOLVED: To provide an ozone treatment apparatus where the surface of a substrate is evenly treated and the reaction efficiency of ozone is improved. SOLUTION: An ozone treatment apparatus has a mounting stage for supporting a substrate K, a heating means for heating the substrate K on the mounting stage, a treatment head arranged above the mounting stage, and a gas supply means for supplying treatment gas containing ozone to the treatment head. The treatment head has a facing plate 35 arranged to face to the substrate K on the mounting stage, and a gas-ejecting means 50 that has an opening 57 formed near the facing plate 35 and directed to a space between the substrate K and the facing plate 35, and ejects the treatment gas supplied from the gas supply means through the opening 57 and blows the gas into the space between the substrate K and the facing plate 35. The facing plate 35 has a pair of protruding portions suspended from the bottom of the plate at a fixed distance such that the portions sandwich the ejected treatment gas from both sides along the flow direction of the gas. COPYRIGHT: (C)2004,JPO
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