| 摘要 |
PROBLEM TO BE SOLVED: To provide a vaporizer which is capable of preventing a solid CVD material from separating out at or attaching to a CVD material feed unit, the CVD material exhaust nozzle of a vaporizing chamber, and its vicinity and vaporizing and supplying the solid CVD material very efficiently with desired concentration at a desired flow rate when a solid CVD material is vaporized and supplied for a long term. SOLUTION: The CVD material feed unit is equipped with a first flow path where the CVD material flows through, a second flow path where a carrier gas flows through, a third flow path through which the CVD material and the carrier gas that have joined together as flowing through the first flow path and the second flow path are spouted out into the vaporizing chamber, and a fourth flow path through which the carrier gas is spouted out into the vaporizing chamber from the periphery of the exhaust nozzle of the third flow path to the vaporizing chamber. Or, the CVD material supply unit is equipped with the first flow path through which the CVD material and the carrier gas are spouted out into the vaporizing chamber and the second flow path through which the carrier gas is spouted out into the vaporizing chamber from the periphery of the exhaust nozzle of the first flow path to the vaporizing chamber. COPYRIGHT: (C)2004,JPO
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