| 摘要 |
PURPOSE: A method for forming an overlay measurement pattern is provided to be capable of increasing the number of overlay measurement patterns capable of being formed while reducing the width of a scribe line. CONSTITUTION: After forming the first overlay measurement pattern(2) at the upper portion of a semiconductor substrate(1), the first insulating layer(3) is formed at the upper portion of the resultant structure for enclosing the first overlay measurement pattern(2). Then, the second overlay measurement pattern(4) is formed at the upper portion of the resultant structure. The second insulating layer(5) is formed at the upper portion of the first insulating layer(3) for enclosing the second overlay measurement pattern. The third overlay measurement pattern(6) is formed at the upper portion of the resultant structure.
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