发明名称 Substrate treatment process
摘要 A substrate treatment process includes plural steps of delivering a long substrate with application of tensile force to the substrate, wherein the strength of the tensile force is changed at least between a first delivery step and a second delivery step. This process prevents enlargement of edge waviness of a belt-shaped substrate to stabilize the plasma discharge.
申请公布号 US6694792(B2) 申请公布日期 2004.02.24
申请号 US20010900010 申请日期 2001.07.09
申请人 CANON KABUSHIKI KAISHA 发明人 TANAKA MASATOSHI;OHTOSHI HIROKAZU;TAKAI YASUYOSHI
分类号 C23C14/56;B21D3/12;C23C16/44;H01L21/203;H01L21/205;H01L31/00;H01L31/0392;H01L31/04;H01L31/075;H01L31/18;H01L31/20;(IPC1-7):B21D3/12 主分类号 C23C14/56
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