SUBSTRATE INSPECTION UNIT AND SUBSTRATE CLEANING EQUIPMENT USING IT

摘要

PROBLEM TO BE SOLVED: To provide a substrate inspection unit which can detect the state of the bottom of a treatment container in which wafers are contained for reducing the break rate of substrates and substrate cleaning equipment which enhances the yield in the cleaning process by using the unit.

SOLUTION: This substrate inspection unit is equipped with the treatment container 10 which forms a predetermined treatment space, a substrate guide 21 which is installed on the bottom of the treatment container 10 to support substrates W so that they are perpendicular to the bottom, first sensors 30 which are installed on both sides of the treatment container 10 and detects substrates W that are supported by the substrate guide 21 so that they are perpendicular to the bottom, and second sensors 50 which are installed on a lower portion and a side of the treatment container 10 and detects any substrates lying on the bottom of the treatment container 10 and any foreign substances.

COPYRIGHT: (C)2004,JPO