发明名称 SUBSTRATE MANUFACTURING METHOD AND LASER PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate manufacturing method capable of increasing laser energy utilization efficiency without increasing coating accuracy of materials for absorbing light energy of infrared laser beams.SOLUTION: A surface layer film is formed by coating a liquid material of the surface layer film absorbing light of a wavelength in an infrared region, on a surface layer conductor layer of a substrate that includes a layered structure in which an inner conductor layer, an insulating layer and the surface layer conductor layer are layered in the order. Via holes are formed in the surface layer conductor layer and the insulating layer by inputting a laser beam in an infrared region into the surface layer film, with a condition that a beam spot is disposed inside the surface layer film in plan view.SELECTED DRAWING: Figure 1-1
申请公布号 JP2016225554(A) 申请公布日期 2016.12.28
申请号 JP20150112762 申请日期 2015.06.03
申请人 SUMITOMO HEAVY IND LTD 发明人 ISO KEIJI
分类号 H05K3/42;B23K26/18;B23K26/386;H05K3/00;H05K3/46 主分类号 H05K3/42
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