发明名称 MANUFACTURING METHOD OF IMAGE FORMING DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a high-performance electron source substrate preventing the deterioration or variation of electron emission property of an electron emission element due to resultant diffusion to a conductive thin film of wiring metal without contact of the wiring metal with the conductive thin film. <P>SOLUTION: The electron source substrate has the electron emission element consisting of the conductive thin film having a pair of element electrodes and an electron emission part and the metal wiring connected to the element electrodes on a substrate, and the element electrode comprises ruthenium oxide on the surface. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004207131(A) 申请公布日期 2004.07.22
申请号 JP20020377087 申请日期 2002.12.26
申请人 CANON INC 发明人 MEGURO TADAYASU;YAMADA NOBUTSUGU;HACHISU TAKAHIRO;ENOMOTO TAKASHI
分类号 H01J9/02;(IPC1-7):H01J9/02 主分类号 H01J9/02
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