发明名称 Semiconductor wafer and method for producing the same
摘要 There is provided a novel bonded semiconductor wafer having a layered structure alternately stacked with semiconductor layers and insulator layers in two cycles or more and manufactured by means of a bonding process, wherein at least one of the insulator layers is formed with ion implanted oxygen, and a novel manufacturing process for a bonded semiconductor wafer in which an ion implantation separation process is adopted. The novel bonded semiconductor wafer is manufactured by means of a bonding process and has a layered structure alternately stacked with semiconductor layers and insulator layers in two cycles or more, wherein at least one of the insulator layers is formed with ion implanted oxygen.
申请公布号 US6770507(B2) 申请公布日期 2004.08.03
申请号 US20010926190 申请日期 2001.09.20
申请人 SHIN-ETSU HANDOTAI CO., LTD 发明人 ABE TAKAO;MATSUURA TAKASHI;MUROTA JUNICHI
分类号 H01L21/265;H01L21/02;H01L21/762;H01L27/12;(IPC1-7):H01L21/00;H01L21/30;H01L21/76;H01L21/823 主分类号 H01L21/265
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