发明名称 |
Semiconductor wafer and method for producing the same |
摘要 |
There is provided a novel bonded semiconductor wafer having a layered structure alternately stacked with semiconductor layers and insulator layers in two cycles or more and manufactured by means of a bonding process, wherein at least one of the insulator layers is formed with ion implanted oxygen, and a novel manufacturing process for a bonded semiconductor wafer in which an ion implantation separation process is adopted. The novel bonded semiconductor wafer is manufactured by means of a bonding process and has a layered structure alternately stacked with semiconductor layers and insulator layers in two cycles or more, wherein at least one of the insulator layers is formed with ion implanted oxygen.
|
申请公布号 |
US6770507(B2) |
申请公布日期 |
2004.08.03 |
申请号 |
US20010926190 |
申请日期 |
2001.09.20 |
申请人 |
SHIN-ETSU HANDOTAI CO., LTD |
发明人 |
ABE TAKAO;MATSUURA TAKASHI;MUROTA JUNICHI |
分类号 |
H01L21/265;H01L21/02;H01L21/762;H01L27/12;(IPC1-7):H01L21/00;H01L21/30;H01L21/76;H01L21/823 |
主分类号 |
H01L21/265 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|