发明名称 SUBSTRATE TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate treating device that is excellent in maintainability and does not leave marks of thermal transfer on a substrate. SOLUTION: Supporting balls 50 connected to each other through wire rods 54 are placed on the surface of a hot plate 45. The supporting balls 50 are formed of, for example, a PEEK (polyether ether ketone). The wire rods 54 are formed of, for example, SUS (stainless steel) etc., and have hooks 54a used for attaching the wire rods 54 to the hot plate 45 at both ends. Before connecting the supporting balls 50 to each other through the wire rods 54, holes having a size with which a wire rod 54 can pass through the hole are previously formed in the balls 50. In addition, springs are attached to one ends of the wire rods 54. The wire rods 54 are passed through the holes of the supporting balls 50 and the balls 50 are fixed to the wire rods 54. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004288717(A) 申请公布日期 2004.10.14
申请号 JP20030076097 申请日期 2003.03.19
申请人 TOKYO ELECTRON LTD 发明人 SAKAI MITSUHIRO
分类号 H01L21/683;H01L21/027;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/683
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