TRANSPARENT ELECTRODE-EQUIPPED SUBSTRATE AND METHOD FOR PRODUCING TRANSPARENT ELECTRODE-EQUIPPED SUBSTRATE

摘要

A transparent electrode-equipped substrate (21) is provided with a metal oxide transparent electrode layer (13) on a transparent substrate (12). The average maximum curvature Ssc of the surface of the transparent electrode layer is preferably 5.4 × 10-4 nm-1 or less. For example, if the transparent electrode layer is subjected to a surface treatment by low discharge-power sputtering after film formation, the Ssc of the transparent electrode layer can be reduced. This transparent electrode-equipped substrate excels in close adhesion between the transparent electrode layer (13) and a metal lead wire (14) disposed on the transparent electrode layer. The transparent electrode layer (13) is obtained by, for example, performing a transparent electrode film-production step through the application of a first discharge power and then performing a surface treatment step through the application of a second discharge power.