AQUEOUS AMMONIUM FLUORIDE AND AMINE CONTAINING COMPOSITIONS FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATES

摘要

A SEMICONDUCTOR WAFER FORMULATION FOR USE IN POST PLASMA ASHING SEMICONDUCTOR FABRICATION COMPRISING THE FOLLOWING COMPONENTS IN THE PERCENTAGE BY WEIGHT RANGES SHOWN: AMMONIUM FLUORIDE AND/OR A DERIVATIVE THEREOF;1-21 AN ORGANIC AMINE OR MIXTURE OF TWO AMINES;20-55 WATER; 23-50 A METAL CHELATING AGENT OR MIXTURE OF CHELATING AGENTS. 0-21