SILICON OPTICAL BENCH MANUFACTURING METHOD FOR FORMING FINE 3-DIMENSIONAL ETCHING STRUCTURE

摘要

PURPOSE: A silicon optical bench manufacturing method is provided to manufacture an optical bench having a fine 3-dimensional etching structure by forming etching structures having different etching depths with only one photomask. CONSTITUTION: A first mask layer(20) is formed on a silicon substrate(10). A second mask layer pattern is formed on the first mask layer on a region where an etching structure having a shallow etching depth is to be formed. The first and second mask layers are exposed. A portion of the exposed first mask layer is etched and removed and the exposed second mask layer is removed. The exposed portion of the first mask layer is etched until the silicon substrate appears. The exposed substrate is etched for the first time to a depth difference of etching structures to form an etching structure having a deep etching depth. All of the first mask layer is etched. The first mask layer is removed.