LIGHT DELIVERY METHOD, LIGHT DELIVERY SYSTEM AND WAFER EDGE EXPOSURE APPARATUS WITH THE SAME

摘要

PURPOSE: A light delivery method, a light delivery system and a WEE(Wafer Edge Exposure) apparatus with the same are provided to reduce WEE time and to improve throughput per a unit time by delivering each split ray of laser beam having the same intensity to WEE units at a time using splitters. CONSTITUTION: A ray of laser beam is generated from a laser(202). The laser beam is split into rays of laser beam by using a plurality of splitters(210). At this time, the split rays of laser beam have the same intensity. The split rays of laser beam are guided to edges of wafers, respectively. The laser beam is one selected from a group consisting of XeF, XeCl, KrF, ArF, or F2 excimer laser beam.