发明名称 |
METHOD FOR MANUFACTURING COLOR FILTER, METHOD FOR MANUFACTURING THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING ELECTRO-OPTICAL DEVICE, AND METHOD FOR MANUFACTURING ELECTROLUMINESCENCE DEVICE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a color filter manufacturing method capable of accurately forming a pattern in the case of forming a prescribed pattern on a substrate by using a liquid drop discharging head. <P>SOLUTION: In the case of forming a color filter consisting of a plurality of colors by discharging liquid drops from the liquid drop discharging head while relatively moving the liquid drop discharging head and a substrate, liquid drops are discharged so that liquid drops arranged on the substrate are not mutually overlapped or the liquid drops arranged on the substrate are overlapped only by≤10% of the diameter of each liquid drop. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
申请公布号 |
JP2004326126(A) |
申请公布日期 |
2004.11.18 |
申请号 |
JP20040162278 |
申请日期 |
2004.05.31 |
申请人 |
SEIKO EPSON CORP |
发明人 |
FURUSAWA MASAHIRO;HIRAI TOSHIMITSU |
分类号 |
G02B5/20;B05D1/26;B05D7/00;H01L51/50;H05B33/10;H05B33/12;H05B33/14;(IPC1-7):G02B5/20 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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