发明名称 |
TFT SUBSTRATE FOR INCREASING A STORAGE CAPACITANCE WITHOUT THE REDUCTION OF THE OPENING RATIO |
摘要 |
PURPOSE: A TFT(Thin Film Transistor) substrate is provided to increase a storage capacitance without the reduction of the opening ratio by forming a storage capacitor in not entire region but local region of the edge of the pixel electrode region. CONSTITUTION: A TFT substrate comprises a substrate(110), an active layer(110) on the substrate, a gate line(130) having a gate electrode(132), a gate insulating layer, a date line(150) having source and drain electrodes(152,154), and a pixel electrode(160) connected with the drain electrode. The pixel electrode is formed in a pixel electrode region. The TFT substrate further comprises a storage capacitor having two storage capacitance electrodes(134,156). This storage capacitor is formed in not entire region but local region of the edge of the pixel electrode.
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申请公布号 |
KR20040098456(A) |
申请公布日期 |
2004.11.20 |
申请号 |
KR20030030829 |
申请日期 |
2003.05.15 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, CHEOL HO;KIM, CHEOL MIN;KIM, IL GON;PARK, TAE HYEONG |
分类号 |
G02F1/136;(IPC1-7):G02F1/136 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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