发明名称 Exposing apparatus and exposing method for microlens array
摘要 An exposing apparatus for a microlens array allows for easy alignment and attains high accuracy. An exposing method for a microlens array attains high accuracy and high light efficiency. The exposing apparatus for a microlens array includes a micro fly-eye lens for converting a light beam from a light source into a secondary point light source, a transmittance distribution mask for adjusting the luminance of the light of the secondary point light source, and a collimator lens for converting the light of adjusted luminance into a parallel light beam and for guiding the parallel light beam, via a first microlens array which is formed in advance, to a photosensitive resin layer to be a second microlens array. The light emitted from the light source is transmitted through the micro fly-eye lens, the transmittance distribution mask, and the collimator lens. The light is then adjusted to a desired luminance to expose the photosensitive resin of a microlens substrate.
申请公布号 US6822799(B2) 申请公布日期 2004.11.23
申请号 US20030650599 申请日期 2003.08.27
申请人 SHARP KABUSHIKI KAISHA 发明人 KITAMURA KAZUYA;OKADA KUNIAKI;SEKIMOTO YOSHIHIRO;KURATA YUKIO;NAKANISHI HIROSHI
分类号 G02B3/00;G02B9/00;G02B27/10;G02B27/18;G02F1/13;G03B21/14;G03B27/54;G03C5/00;H01L21/027;(IPC1-7):G02B27/10 主分类号 G02B3/00
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