发明名称 METHOD FOR MEASURING SURFACE POSITION OF MELT IN SINGLE CRYSTAL PULLING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method for measuring the surface position of a melt during pulling up a single crystal in a process for pulling up the single crystal, being used as a material for a semiconductor, from the melt by a CZ method. SOLUTION: In the single crystal pulling up process, the surface position of the melt is measured by setting two measuring lines in an image of a fusion ring measured by two dimensional CCD camera, then detecting intersection points at both sides of respective measuring lines and the fusion ring, and calculating the center position of the single crystal, based on the intervals between the intersection points at the both sides. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004331437(A) 申请公布日期 2004.11.25
申请号 JP20030127968 申请日期 2003.05.06
申请人 SUMITOMO MITSUBISHI SILICON CORP 发明人 TAKANASHI KEIICHI;TAKASE NOBUMITSU
分类号 C30B15/22;C30B15/00;C30B15/26;(IPC1-7):C30B15/22 主分类号 C30B15/22
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