| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a device manufacturing method and a mask used for the method that forms an image of an isolated shape, particularly an image of a dark shape against a bright backdrop with an increased depth of focus. <P>SOLUTION: There are provided the device manufacturing method, a mask set used for the method, a data set for controlling a programmable pattern forming apparatus, a method of forming a mask pattern, and a computer program. Isolated dark figures, e.g., contact holes or lines are exposed in a double exposure. Different irradiating settings are used in the double exposure. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
