WET CLEANING METHOD OF SEMICONDUCTOR WAFER FOR IMPROVING UNIFORMITY OF CLEANING

摘要

PURPOSE: A method is provided to clean uniformly a semiconductor wafer by rotating the wafer in a cleaning solution of a cleaning bath. CONSTITUTION: An aligned semiconductor wafer(100a) is immersed into a cleaning solution of a cleaning bath(200). The immersed wafer is rotated to a predetermined direction in the cleaning bath. At this time, a flat zone(102) of the wafer is opposite to a bottom portion of the cleaning bath. A cleaning process is performed on the wafer for a predetermined period. The cleaned wafer is unloaded from the cleaning bath.