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发明名称
碳氧化矽低介电常数(K)膜之应力缩减
摘要
一种沉积一低介电常数膜的方法,包含提供包含一或多数环状有机矽氧烷及一或多数惰性气体的一气体混合物至一室中之基材。于一态样中,该气体混合物更包含一或多数氧化气体。进入该室中之一或多数环状有机矽氧烷的总流率对进入室中之一或多数惰性气体的总流率之比例系由约0.10至约0.20。较佳地,该低介电常数膜具有压缩应力。
申请公布号
TW200510561
申请公布日期
2005.03.16
申请号
TW093123963
申请日期
2004.08.10
申请人
应用材料股份有限公司
发明人
史密特法兰丝玛C SCHMITT, FRANCIMAR C.;姆萨德希肯
分类号
C23C16/00
主分类号
C23C16/00
代理机构
代理人
蔡坤财
主权项
地址
美国
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