发明名称 |
ACTIVE MATRIX SUBSTRATE AND ITS MANUFACTURING METHOD, AND INTERMEDIATE TRANSFER SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing an active matrix substrate having high transfer selectivity, the active matrix substrate which is manufactured by the method, and an intermediate transfer substrate used for the method. SOLUTION: The active matrix substrate is equipped with: a substrate; a plurality of adhesion layers provided in a matrix on a pixel area on the substrate; a plurality of active devices provided on the respective adhesion layers; and spacer layers which are provided in the peripheral areas of the pixel area on the substrate. COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005099409(A) |
申请公布日期 |
2005.04.14 |
申请号 |
JP20030332815 |
申请日期 |
2003.09.25 |
申请人 |
TOSHIBA CORP |
发明人 |
ONOZUKA YUTAKA;AKIYAMA MASAHIKO;HARA YUJIRO;MIURA KENTARO |
分类号 |
G02F1/13;G02F1/1333;G02F1/1339;G02F1/136;H01J1/62;H01J63/04;H01L21/00;H01L21/02;H01L21/336;H01L21/76;H01L27/12;H01L27/146;H01L29/786;(IPC1-7):G02F1/133;G02F1/133 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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