发明名称 ACTIVE MATRIX SUBSTRATE AND ITS MANUFACTURING METHOD, AND INTERMEDIATE TRANSFER SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing an active matrix substrate having high transfer selectivity, the active matrix substrate which is manufactured by the method, and an intermediate transfer substrate used for the method. SOLUTION: The active matrix substrate is equipped with: a substrate; a plurality of adhesion layers provided in a matrix on a pixel area on the substrate; a plurality of active devices provided on the respective adhesion layers; and spacer layers which are provided in the peripheral areas of the pixel area on the substrate. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005099409(A) 申请公布日期 2005.04.14
申请号 JP20030332815 申请日期 2003.09.25
申请人 TOSHIBA CORP 发明人 ONOZUKA YUTAKA;AKIYAMA MASAHIKO;HARA YUJIRO;MIURA KENTARO
分类号 G02F1/13;G02F1/1333;G02F1/1339;G02F1/136;H01J1/62;H01J63/04;H01L21/00;H01L21/02;H01L21/336;H01L21/76;H01L27/12;H01L27/146;H01L29/786;(IPC1-7):G02F1/133;G02F1/133 主分类号 G02F1/13
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