| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To excellently reproduce a glass substrate for mask blanks by securely peeling a thin film while suppressing roughness of the glass substrate when the thin film containing metal, silicon, and nitrogen is peeled with peeling liquid. <P>SOLUTION: The glass substrate for mask blanks which has the thin film, principally containing metal, silicon, and nitrogen, formed on the glass substrate is reproduced by peeling the thin film off the glass substrate by bringing it into contact with a solution which contains at least one fluorine compound selected out of hydrofluoric acid, hydrosilicofluoric acid, and ammonium hydrofluoride and at least one oxidizer selected out of hydrogen peroxide, nitric acid, and sulfuric acid and contains the fluorine compound of 0.1 to 0.8 wt.%. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
