RÖNTGENANALYSEGERÄT MIT RÖNTGENOPTISCHEM HALBLEITERBAUELEMENT UND VERFAHREN ZU DESSEN HERSTELLUNG

摘要

The X-ray analyzer (1) comprises an X-ray optical component in the form of a semiconductor wafer with etched parallel micropores. The X-ray analyzer (1) has an X-ray optical component located between the X-ray source (2) and the detector (12,14) and comprising a semiconductor wafer with etched parallel micropores of 0.1-100 micro m, preferably 0.5-20 mu m, diameter extending in the beam direction. An Independent claim is also included for an X-ray optical component for use in the above X-ray analyzer.