发明名称 FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD
摘要 <p>A particle film deposition method provides ultrafine particles generated by arc heating. An electrode is employed with at least two sub-electrodes each radially aligned toward the same part of a material. The material is evaporated by an arc discharge via the electrode, particles are generated from the evaporated material and the particles collide against a substrate.</p>
申请公布号 KR100549599(B1) 申请公布日期 2006.02.03
申请号 KR20030025891 申请日期 2003.04.24
申请人 发明人
分类号 H05H1/48;B01J19/08;C23C14/24;C23C14/32;H05H1/24 主分类号 H05H1/48
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