| 摘要 |
PROBLEM TO BE SOLVED: To provide the substrate holding device which can execute the maintenance easily and prevent liquid from entering the backside of the substrate. SOLUTION: A substrate holder PH has a base PHB, a first holder PH1 which is formed on the base PHB for suction-holding a substrate P, and a second holder PH2 which is formed on the base PHB for suction-holding a plate member T near the substrate P suction-held by the first holder PH1. In the aligner having the substrate holder PH, a plate can be exchanged easily, thereby making the maintenance of the apparatus easy. Consequently, such an exposure apparatus is suitable for immersion exposure. COPYRIGHT: (C)2006,JPO&NCIPI
|
