发明名称 |
CW DUV Laser With Improved Stability |
摘要 |
A deep ultra-violet (DUV) continuous wave (CW) laser includes a fundamental CW laser configured to generate a fundamental frequency with a corresponding wavelength between about 1 μm and 1.1 μm, a third harmonic generator module including one or more non-linear optical (NLO) crystals that generate a third harmonic and an optional second harmonic, and a fifth harmonic generator. The fifth harmonic generator module includes a cavity resonant at the fundamental frequency, and combines the fundamental frequency with the third harmonic in a first NLO crystal to generate a fourth harmonic, then combines the fourth harmonic with unconsumed fundamental frequency in a second NLO crystal to generate the fifth harmonic. One or more lenses are used to focus the third and fourth harmonics in the first and second NLO crystals, respectively. |
申请公布号 |
US2017070025(A1) |
申请公布日期 |
2017.03.09 |
申请号 |
US201615335266 |
申请日期 |
2016.10.26 |
申请人 |
KLA-Tencor Corporation |
发明人 |
Chuang Yung-Ho;Lu Xiaoxu;Fielden John |
分类号 |
H01S3/109 |
主分类号 |
H01S3/109 |
代理机构 |
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代理人 |
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主权项 |
1. A deep ultra-violet (DUV) continuous wave (CW) laser comprising:
a fundamental CW laser configured to generate a fundamental frequency with a corresponding wavelength between about 1 μm and 1.1 μm; a third harmonic generator module configured to generate a third harmonic using a first portion of the fundamental frequency; a fifth harmonic generator module comprising:
a plurality of optical elements forming a cavity resonant at the corresponding wavelength of the fundamental frequency, the plurality of optical elements being configured to operably couple the third harmonic and a second portion of the fundamental frequency in the cavity, andfirst and second NLO crystals operably disposed in the cavity and collectively configured to generate a fifth harmonic by combining the second fundamental frequency portion and the third harmonic. |
地址 |
Milpitas CA US |