发明名称 SINGLE CRYSTAL SILICON CONTACT FOR INTEGRATED CIRCUITS AND METHOD FOR MAKING SAME
摘要 The method for making a single crystal silicon contact for integrated circuits is described. The epitaxial contact is self-patterning and is formed by coherent growth on a surface of monocrystalline silicon for protecting and contacting said surface.
申请公布号 US3717514(A) 申请公布日期 1973.02.20
申请号 USD3717514 申请日期 1970.10.06
申请人 MOTOROLA INC,US 发明人 BURGESS R,US
分类号 H01L21/00;H01L21/285;H01L23/29;H01L23/485;(IPC1-7):H01L7/36 主分类号 H01L21/00
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