| 摘要 |
PROBLEM TO BE SOLVED: To provide a new method for manufacturing silicon containing powder using thermal plasma, capable of obtaining the silicon containing powder having spherical fine particles.SOLUTION: The method for manufacturing a silicon containing powder includes a DC plasma step of heating and ejecting raw powder containing silicon using direct-current thermal plasma. In the DC plasma step, a mixed gas of an argon (Ar) gas with a diatomic molecule gas or polyatomic molecule gas is used as a plasma gas. In the plasma gas, a mixed rate of the argon (Ar) gas with the diatomic molecule gas or polyatomic molecule gas is 99:1-10:90 in a flow ratio.SELECTED DRAWING: Figure 1 |
