| 摘要 |
On a substrate conforming to a layout method for a plurality of marks for detecting using a plurality of mark detection systems (AL1, AL21-AL24) of which the detection centers are arranged at prescribed intervals along an X-axis direction, a plurality of shot areas Si (i = 1, 2, …) are formed in both an X-axis direction and a Y-axis direction orthogonal thereto in an XY plane, groups including at least two marks (WMj) (j = 1, 2, 3, 4, 5) separated in the X-axis direction are repeatedly arranged along the X-axis direction at intervals of the X-axis-directional length (w) of each shot area (Si), and the marks belonging to each group are separated from each other in the X-axis direction by an interval determined on the basis of the X-axis-directional arrangement of the plurality of mark detection systems (AL1, AL21-AL24) and the length (w). It is thereby possible to reliably detect a plurality of marks on a substrate using a plurality of mark detection systems. |
