Defect inspection method and defect inspection device

摘要

A defect inspection method and device for irradiating a linear region on a surface-patterned sample mounted on a table, with illumination light from an inclined direction to the sample, next detecting in each of a plurality of directions an image of the light scattered from the sample irradiated with the illumination light, then processing signals obtained by the detection of the images of the scattered light, and thereby detecting a defect present on the sample; wherein the step of detecting the scattered light image in the plural directions is performed through oval shaped lenses in which elevation angles of the optical axes thereof are different from each other, within one plane perpendicular to a plane formed by the normal to the surface of the table on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light.

主权项

1. A defect inspection device, comprising:
an irradiation unit that irradiates a surface-patterned sample with light from an inclined direction relative to the surface of the sample; a detection unit that includes a plurality of detection optical systems to detect respectively a plurality of portions of scattered light coming from the surface of the sample irradiated with light by the irradiation unit; and a processing unit that processes a plurality of signals based on the plurality of the portions of the scattered light detected respectively by the plurality of the detection optical systems in the detection unit, wherein: the detection unit detects the plurality of the portions of the scattered light using the plurality of the detection optical systems including, at least, a first detection optical system including a detector placed in a normal direction relative to the surface of the sample, a second detection optical system including a detector placed in a direction at an elevation angle relative to the surface of the sample different from an elevation angle at which the first detection optical system is located, and a third detection optical system including a detector placed in a direction at an elevation angle relative to the surface of the sample different from the elevation angles at which the first detection optical system and the second detection optical system are located; and the processing unit evaluates, relative to a first signal based on the first portion of the scattered light detected by the first detection optical system, a second signal based on the second portion of the scattered light detected by the second detection optical system and a third signal based on the third portion of the scattered light detected by the third detection optical system in order to detect a defect.