Array substrate and method for manufacturing the same, and display device

摘要

The present invention provides an array substrate and a method for manufacturing the same, and a display device. Wherein, after forming a pattern corresponding to a source/drain electrode layer, a transparent conducting layer is formed, and then a passivation layer is formed on the transparent conducting layer. Because the transparent conducting layer has a characteristic of anti-etching, it is hard to be damaged, so that the problem of damage of copper in the source/drain electrode layer is solved without increasing the process steps for forming the array substrate.

主权项

1. An array substrate, comprising a TFT, a pixel electrode and a transparent conducting layer connected with a drain electrode of the TFT having a source/drain electrode layer with an upper side surface, wherein, the array substrate further comprises:
the transparent conducting layer formed directly upon the upper side surface of the source/drain electrode layer and in physical contact with the source/drain electrode layer; and a passivation layer formed directly upon the transparent conducting layer and in physical contact with the transparent conducting layer such that the transparent conducting layer lies between the passivation layer on one side thereof and the upper side surface of the source/drain electrode layer on the opposite side thereof, and wherein the transparent conducting layer and the pixel electrode are formed from a same layer.