Method for evaluating charged particle beam drawing apparatus

摘要

In one embodiment, a charged particle beam drawing apparatus performs drawing by deflecting a charged particle beam with a deflector. A method for evaluating the apparatus includes making a shot of a first pattern, controlling a deflection amount by the deflector to move an applied position of the beam from the first pattern along a first direction to make a shot of a second pattern, controlling the deflection amount to move the applied position from the second pattern along the first direction to make a shot of a third pattern, controlling the deflection amount to move the applied position from the third pattern along a second direction opposite to the first direction to make a shot of a fourth pattern between the second pattern and the third pattern, calculating an interval between the second pattern and the fourth pattern, and comparing the calculated interval to a reference interval.

主权项

1. A method for evaluating a charged particle beam drawing apparatus which performs drawing by deflecting a charged particle beam with a deflector disposed on an optical path for the charged particle beam, the method comprising:
making a shot of a first pattern; controlling an amount of deflection by the deflector to move an applied position of the charged particle beam from the first pattern along a first direction, and making a shot of a second pattern; controlling the amount of deflection by the deflector to move the applied position of the charged particle beam from the second pattern along the first direction, and making a shot of a third pattern; controlling the amount of deflection by the deflector to move the applied position of the charged particle beam from the third pattern along a second direction opposite to the first direction, and making a shot of a fourth pattern between the second pattern and the third pattern; measuring positions of the second pattern and the fourth pattern and calculating an interval between the second pattern and the fourth pattern; and comparing the calculated interval to a reference interval.