WERKWIJZE VOOR HET EGALISEREN VAN EEN OPPERVLAK MET BEHULP VAN EEN FOTORESISTIEF MASKER EN IN- RICHTING VOORZIEN VAN EEN DERGELIJK OPPERVLAK.

摘要

An integrated circuit substrate surface, particularly a surface of electrically insulative material, having a pattern of elevated areas and a complementary pattern of unelevated areas is planarized by forming the photoresist pattern in registration with the pattern of unelevated areas, the photoresist pattern having narrower lateral dimensions than said elevated pattern whereby registration is facilitated, flowing the photoresist pattern to laterally expand the photoresist to cover and thereby mask the unelevated areas, and etching to lower the elevated areas which remain uncovered by the photoresist.