| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a gas barrier film having a high gas barrier property and excellent in storage stability under a high temperature condition.SOLUTION: A method for manufacturing a gas barrier film having at least one layer of a gas barrier film on a film base material, comprising; (1) a step of forming a coating film by applying a solution containing a silicon oxide precursor or silicon oxynitride precursor to the film base material; (2) a step of irradiating the coating film with an ultraviolet light containing a wavelength component less than 200 nm; and (3) a step of irradiating the coating film with an ultraviolet light having a wavelength not less than 200 nm but less than 230 nm. |
