| 摘要 |
<p>A positive-working electron resist which comprises a film-forming co-polymer B-D which is cross-linkable by carboxylic acid anhydride groups. The co-polymer B-D is formed from an unsaturated organic compound B and an unsaturated carboxylic acid chloride D. The cross-links are formed by heating a film of the resist in a moist atmosphere, some of the carboxylic acid chloride groups being hydrolysed so as to form carboxylic acid groups, at least some of these carboxylic acid groups reacting with carboxylic acid groups of different molecules of the co-polymer B-D so as to form carboxylic acid anhydride bridge links between these different molecules. The cross-linked material is insoluble in solvents in which the monomers B and D and the co-polymer B-D are normally soluble. Electron irradiation of the cross-linked material breaks the cross-links and restores the readily soluble straight chain forms, so that during development of an irradiated resist pattern, a solvent is used only to dissolve soluble material in the areas which have been irradiated.</p> |
