发明名称 Light-sensitive high molecular weight compound capable of being cross-linked by irradiation with light or an electron beam
摘要 Light sensitive high molecular weight compounds containing furanacrylate groups in the molecule, which can be suitably used for the preparation of photopolymerizable compositions used in light sensitive materials such as, e.g., a photoresist, a method for forming images using the high molecular weight compounds which undergo a change in solubility or are rendered insoluble upon irradiation and a method for preparing the high molecular weight compounds containing the novel structure by homo- or copolymerization of a monomeric vinyl ether or epoxy compound containing a furanacrylate group in the molecule.
申请公布号 US3993624(A) 申请公布日期 1976.11.23
申请号 US19730414609 申请日期 1973.11.08
申请人 FUJI PHOTO FILM CO., LTD. 发明人 MAEKAWA, YUKIO;SATOMURA, MASATO;UMEHARA, AKIRA
分类号 C07D307/54;C08F16/32;C08G65/22;C08L71/02;G03F7/038;(IPC1-7):C08F132/06;C08F136/00;C08F124/00;C08F220/42 主分类号 C07D307/54
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