| 摘要 |
Disclosed are a structure and manufacturing method of an AMOLED display device. The manufacturing method of the AMOLED display device comprises: depositing an inorganic film layer and performing a plasma bombardment process thereon to form a gate anti-reflection layer (2) before forming a gate (3); and depositing an inorganic film layer and performing the plasma bombardment process thereon to form an etch stop and source/drain anti-reflection layer (6) before forming a source/drain (71) and a data line (72). The present invention can provide the AMOLED display device with a good anti-reflection effect to environmental light, an increased display brightness, an extended service life, and a reduced thickness and manufacturing cost. With the gate metal anti-reflection layer (2) and an etch stop and source/drain anti-reflection layer (6), the structure of the AMOLED display device has a good anti-reflection effect to environmental light, increased display brightness and service life, reduced thickness and low manufacturing cost. |
