| 摘要 |
PROBLEM TO BE SOLVED: To provide an end face polishing film for a ferrule, having a high grinding force along with a high polishing precision that are required for an intermediate finishing process.SOLUTION: An end face polishing film of the present invention is an end face polishing film for a ferrule which is equipped with a film-like substrate and a polishing layer stacked on its surface side. The polishing layer contains a plurality of aggregate particles and its first binder. The aggregate particles contain a plurality of polishing particles and its second binder. The average particle size of the aggregate particles is 15-80 μm. The maximum particle size of the aggregate particles is 120 μm or less. The average thickness of the substrate is preferred to be 50 μm or more and 125 μm or less. The average particle size of the polishing particles is preferred to be 1 μm or more and 2.8 μm or less. The content rate of the polishing particles in the aggregate particles is preferred to be 55 vol.% or more and 85 volume % or less.SELECTED DRAWING: Figure 1B |
